TechTalk – Wafer-scale Structural Coloration Using Gray-scale Lithographic Fabrication
November 28, 2024 (Thursday) 4:30-5:30pm
Structural colors use nanostructured building blocks or thin films to resonantly reflect or scatter light to generate colors and can exhibit higher resolution, saturation, and durability than pigment-based colors. To create structural color based paintings, it is essential to develop a capability of spatially varying the dimensions of these nanosized structures. Recently we reported a high-throughput and wafer-scale nanopatterning method by combining interference lithography and grayscale-patterned secondary exposure (IL-GPSE) to spatially modulate nanostructure feature sizes on large scale while maintaining sufficiently high resolution. Here, we employ the IL-GPSE method in the fabrication of wafer-scale structural color paintings, which can improve the patterning efficiency by orders of magnitude when compared with e-beam lithography. The fabrication techniques developed in this work have unique potentials for broader applications in biomedical sensing, spectral filtering, anti-counterfeiting or encryption, etc.